Samco Inc.
Semiconductor deposition, etching and surface treatment equipment for R&D and production
Overview
That year it delivered its first plasma CVD system, for a-Si solar cell research. The company has since grown into a global group with nearly 200 employees. Its headquarters are in Kyoto, with offices in the U.S., China, Korea, Singapore, Malaysia and Taiwan and a partner in Liechtenstein.
Samco focuses on thin-film technology in three areas. These are chemical vapor deposition (CVD), dry etching and dry cleaning. Its etching systems process compound semiconductors such as GaN, GaAs and InP, as well as silicon, SiC and other materials. It was the first Japanese semiconductor process equipment maker to offer silicon deep reactive ion etching (DRIE) systems using the Bosch process.
The systems serve research institutions and device production. Target applications include compound semiconductors, MEMS, power and RF devices, optoelectronics, quantum computing and microfluidics. In August 2026 the company announced that its 5,000th system, an RIE-200NL etcher, will go to Tohoku University.
Products
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Factory & locations
Samco Inc.
Semiconductor deposition, etching and surface treatment equipment for R&D and production
Overview
That year it delivered its first plasma CVD system, for a-Si solar cell research. The company has since grown into a global group with nearly 200 employees. Its headquarters are in Kyoto, with offices in the U.S., China, Korea, Singapore, Malaysia and Taiwan and a partner in Liechtenstein.
Samco focuses on thin-film technology in three areas. These are chemical vapor deposition (CVD), dry etching and dry cleaning. Its etching systems process compound semiconductors such as GaN, GaAs and InP, as well as silicon, SiC and other materials. It was the first Japanese semiconductor process equipment maker to offer silicon deep reactive ion etching (DRIE) systems using the Bosch process.
The systems serve research institutions and device production. Target applications include compound semiconductors, MEMS, power and RF devices, optoelectronics, quantum computing and microfluidics. In August 2026 the company announced that its 5,000th system, an RIE-200NL etcher, will go to Tohoku University.
- Founded
- 1979
- Headquarters
- Kyoto, Japan
- Employees
- Nearly 200
- Core technology
- Thin-film deposition, dry etching, dry cleaning
- Name origin
- Semiconductor And Materials COmpany
- U.S. offices
- Sunnyvale, CA and Iselin, NJ
Products
RIE-400iP ICP-RIE plasma etching systemICP-RIE4-inchLoad lock
RIE-400iP-ALE / RIE-800iP-ALE atomic layer etching systemsALEICP
RIE-10NR compact RIE plasma etching systemRIEBenchtopOpen load- RIE-200NL reactive ion etcherRIE
Silicon Deep RIE (DRIE) systemsBosch processMEMSTSV
VPE-4F xenon difluoride (XeF2) etching systemXeF2TabletopMEMS
Cathode PECVD systemsSiO2TEOSUp to 100 µm
Anode PECVD systems (incl. PD-220NL, PD-2201HLC)PECVDSiNSiO2
Atomic Layer Deposition (ALD) systemsALDAngstrom control
Aqua Plasma, plasma cleaning and UV ozone cleaning systemsAqua PlasmaUV ozoneDry cleaning
Contact
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Factory
- Production Building I
- Production Building II
- OPTO Films Research Laboratory (West Coast Office)